Strategic partnership aims to foster new advancements in sustainable initiatives in the semiconductor industry.
The New York Center for Research, Economic Advancement, Technology, Engineering, and Science (NY CREATES) and SEMI announced the signing of a memorandum of understanding (MOU) to establish a strategic framework aimed at fostering interdisciplinary collaboration and promoting environmentally sustainable practices within the semiconductor industry.
This MOU sets the stage for joint development agreements and research programs that will align with sustainable strategies for the industry as it continues to grow, with an emphasis on per- and polyfluoroalkyl substances (PFAS) abatement to further move the industry toward greener practices.
“While the semiconductor industry is set to ride the Artificial Intelligence wave to tremendous growth, we face serious challenges, with sustainability standing out as a top concern,” said Ajit Manocha, SEMI president and CEO. “Unprecedented challenges around climate change and PFAS call for unprecedented actions and public-private partnership. This agreement is a positive step forward in aligning the efforts of the SEMI Sustainability Initiative and Semiconductor Climate Consortium (SCC) with government programs to maximize the impact.”
"We look forward to collaborating with our industry partners on this critical initiative, as we focus on meaningfully ensuring we advance the technologies of tomorrow in a sustainable way today," said NY CREATES president Dave Anderson. "Signing this agreement ensures we provide leadership in the area of environmental responsibility. This is important while we simultaneously establish our new High NA Extreme Ultraviolet Lithography Center and expand capabilities at our Albany NanoTech Complex."
This MOU sets the foundation for entering into one or more joint development agreements that foster innovative solutions to address semiconductor and related manufacturing challenges that have an impact on the environment and community. For example, novel approaches can be created and implemented to reduce greenhouse gases, which can be replaced with alternatives using sustainable technologies and new abatement technologies. These activities can help better address PFAS concerns and ensure these chemicals are properly managed when used throughout the semiconductor manufacturing process.
This partnership builds on the momentum in New York created by Governor Hochul's $1 billion investment to fund the construction of a cutting-edge High NA Extreme Ultraviolet Lithography Center that will support the research and development of the world's most complex and powerful semiconductors.
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